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In-house facilities
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2D CVD
2D Material Transfer System
Growth/Deposition Systems
Molecular Beam Epitaxy (MBE)
RF - Sputtering
RF - Sputtering
Pulse Laser Deposition (PLD)
Chemical Vapour Deposition (CVD) System
Thermal (Au & Ag) Deposition
Thermal (Al) Deposition
Rapid Thermal Annealing
Device Fabrications
Electron Beam Lithography (shared facility)
Wire bonder
Characterization Techniques
Atomic Force Microscopy (AFM)
X-ray Diffractometer (XRD)
PL decay measurement unit
with pico-second pulse-laser
Optical measurement units (low-temperature PL (10K - 400K); Variable range of detectors (300 nm to 10 microns; plenty of optical components ( filter, beam-splitter, polariser, objectives, waveplates, LEDs etc.)
Laser sources (325 nm He-Cd; vriable range Ar-laser (457-514 nm), 980 nm)
Electrical & opto-electronics measurement units
Gas & VOC sensing set-up
Chemical synthesis facilities
Chemical work-bench & fume-hood
Chemical resorces
CV analyser
Centrifuger
Weighing tool
Spin-coater
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