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1990

S.K. Ray, C.K. Maiti & N.B. Chakrabarti, "Microwave plasma processing for VLSI technology", IETE Technical Review, 7(5-6), 328-339. DOI: 10.1080/02564602.1990.11438670

N.B. Chakrabarti, S.K. Lahiri, C.K. Maiti, S. Kal, S.K. Ray, A. Dasgupta, G. Eranna & B.C. Roy, "Microelectronics Technology Development at IIT Kharagpur", IETE Technical Review, 7(5-6), 292-298. DOI: 10.1080/02564602.1990.11438666

S.K. Ray, C.K. Maiti & N.B. Chakrabarti, "Electrical properties of silicon dioxide deposited at low temperature by metal-organic microwave plasma CVD technique", Electronics Letters, 26(14), 1082-1083. DOI: 10.1049/el:19900701

S.K. Ray, C.K. Maiti & N.B. Chakraborti, "Low-temperature oxidation of silicon in microwave oxygen plasma", Journal of Materials Science, 25(5), 2344-2348. DOI: 10.1007/BF00638025

S.K. Ray, C.K. Maiti, S.K. Lahiri & N.B. Chakraborti, "Low-temperature deposition of silicon oxide films by microwave plasma CVD of TEOS", Semiconductor science and technology, 5(4), 361. DOI: 10.1088/0268-1242/5/4/017

1987

N.B. Chakraborti & S.K. Ray, "Towards a Design Automation for Dry Etching", Microlithography, 267.,Tata McGraw Hill.

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