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1995

S.K. Ray, C.K. Maiti & S.K. Lahiri, "Chemically assisted ion beam etching of silicon and silicon dioxide using SF6", Plasma Chemistry and Plasma Processing, 15(4), 711-720. DOI: 10.1007/BF01447068

M. Mukhopadhyay, S.K. Ray, C.K. Maiti, D.K. Nayak & Y. Shiraki, "Properties of SiGe oxides grown in a microwave oxygen plasma", Journal of applied physics, 78(10), 6135-6140. DOI: 10.1063/1.360556

M. Mukhopadhyay, S.K. Ray & C.K. Maiti, "Microwave plasma grown oxynitride using nitrous oxide", Electronics Letters, 31(22), 1953-1954. DOI: 10.1049/el:19951332

S.K. Ray, S.K. Mishra, A. Sarkar, A. Dhar, D. Bhattacharya & K.L. Chopra, "Molecular beam epitaxial growth of high-Tc Bi-Sr-Ca-Cu-O Films", Journal of superconductivity, 8(3), 377-381. DOI: 10.1007/BF00728175

1994

Anchor 1994

M. Mukhopadhyay, S.K. Ray, C.K. Maiti, D.K. Nayak & Y. Shiraki, "Electrical properties of oxides grown on strained SiGe layer at low temperatures in a microwave oxygen plasma", Applied physics letters, 65(7), 895-897. DOI: 10.1063/1.112193

S.K. Ray, S. Das, C.K. Maiti, S.K. Lahiri & N.B. Chakraborti, "Effect of reactive‐ion bombardment on the properties of silicon nitride and oxynitride films deposited by ion‐beam sputtering", Journal of applied physics, 75(12), 8145-8152. DOI: 10.1063/1.357027

1993

Anchor 1993

S.K. Mishra, A. Sarkar, S.K. Ray, D. Bhattacharya, K.L. Chopra & S.R. Das, "Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high Tc YBCO films", Journal of Vacuum Science & Technology A, 11(5), 2747-2751. DOI:  10.1116/1.578636

S.K. Ray, C.K. Maiti & N.B. Chakraborti, "Rapid plasma etching of silicon, silicon dioxide and silicon nitride using microwave discharges", Semiconductor science and technology, 8(4), 599. DOI: 10.1088/0268-1242/8/4/019

1992

Anchor 1992

S.K. Mishra, L.C. Pathak, S.K. Ray, S. Kal, D. Bhattacharya, S.K. Lahiri & K.L. Chopra, "Lithographic patterning of superconducting YBCO films", Journal of superconductivity, 5(5), 445-449. DOI:  10.1007/BF00620502

S.K. Ray, C.K. Maiti, S.K. Lahiri & N.B. Chakrabarti, "Properties of silicon dioxide films deposited at low temperatures by microwave plasma enhanced decomposition of tetraethylorthosilicate", Journal of Vacuum Science & Technology B, 10(3), 1139-1150. DOI: 10.1116/1.586090

1991

Anchor 1991

S.K. Ray, C.K. Maiti & N.B. Chakrabarti, "Low-Temperature deposition of dielectric films by microwave plasma enhanced decomposition of hexamethyldisilazane", Journal of electronic materials, 20(11), 907-913. DOI: 10.1007/BF02816031

S.K. Ray, C.K. Maiti & N.B. Chakrabarti, "Fluorine‐enhanced nitridation of silicon at low temperatures in a microwave plasma", Journal of applied physics, 70(3), 1874-1876. DOI: 10.1063/1.349512

S.K. Ray, S. Das, C.K. Maiti, S.K. Lahiri & N.B. Chakrabarti, "Deposition of composition‐controlled silicon oxynitride films by dual ion beam sputtering", Applied physics letters, 58(22), 2476-2478. DOI: 10.1063/1.104848

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